{"id":91986,"date":"2025-09-18T12:06:09","date_gmt":"2025-09-18T10:06:09","guid":{"rendered":"https:\/\/port.lukasiewicz.gov.pl\/silesian-university-of-technology\/researches\/"},"modified":"2025-12-15T11:34:17","modified_gmt":"2025-12-15T10:34:17","slug":"researches","status":"publish","type":"page","link":"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/researches\/","title":{"rendered":"Researches"},"content":{"rendered":"\t\t<div data-elementor-type=\"wp-page\" data-elementor-id=\"91986\" class=\"elementor elementor-91986 elementor-87752\" data-elementor-post-type=\"page\">\n\t\t\t\t<div class=\"elementor-element elementor-element-cdf5687 e-flex e-con-boxed e-con e-parent\" data-id=\"cdf5687\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t<div class=\"elementor-element elementor-element-2ecc936 e-con-full e-flex e-con e-child\" data-id=\"2ecc936\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-bbcbe6b elementor-widget elementor-widget-heading\" data-id=\"bbcbe6b\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h1 class=\"elementor-heading-title elementor-size-default\">Silesian University of Technology<br> <br> <br><\/h1>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4bd8d5b elementor-nav-menu--dropdown-none elementor-widget elementor-widget-nav-menu\" data-id=\"4bd8d5b\" data-element_type=\"widget\" data-e-type=\"widget\" data-settings=\"{&quot;layout&quot;:&quot;horizontal&quot;,&quot;submenu_icon&quot;:{&quot;value&quot;:&quot;&lt;svg aria-hidden=\\&quot;true\\&quot; class=\\&quot;e-font-icon-svg e-fas-caret-down\\&quot; viewBox=\\&quot;0 0 320 512\\&quot; xmlns=\\&quot;http:\\\/\\\/www.w3.org\\\/2000\\\/svg\\&quot;&gt;&lt;path d=\\&quot;M31.3 192h257.3c17.8 0 26.7 21.5 14.1 34.1L174.1 354.8c-7.8 7.8-20.5 7.8-28.3 0L17.2 226.1C4.6 213.5 13.5 192 31.3 192z\\&quot;&gt;&lt;\\\/path&gt;&lt;\\\/svg&gt;&quot;,&quot;library&quot;:&quot;fa-solid&quot;}}\" data-widget_type=\"nav-menu.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t<nav aria-label=\"Menu\" class=\"elementor-nav-menu--main elementor-nav-menu__container elementor-nav-menu--layout-horizontal e--pointer-background e--animation-fade\">\n\t\t\t\t<ul id=\"menu-1-4bd8d5b\" class=\"elementor-nav-menu\"><li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91990\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/\" class=\"elementor-item\">About Us<\/a><\/li>\n<li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91993\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/researches\/\" class=\"elementor-item\">Researches<\/a><\/li>\n<li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91992\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/publications\/\" class=\"elementor-item\">Publications<\/a><\/li>\n<li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91991\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/activity\/\" class=\"elementor-item\">Activity<\/a><\/li>\n<\/ul>\t\t\t<\/nav>\n\t\t\t\t\t\t<nav class=\"elementor-nav-menu--dropdown elementor-nav-menu__container\" aria-hidden=\"true\">\n\t\t\t\t<ul id=\"menu-2-4bd8d5b\" class=\"elementor-nav-menu\"><li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91990\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/\" class=\"elementor-item\" tabindex=\"-1\">About Us<\/a><\/li>\n<li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91993\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/researches\/\" class=\"elementor-item\" tabindex=\"-1\">Researches<\/a><\/li>\n<li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91992\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/publications\/\" class=\"elementor-item\" tabindex=\"-1\">Publications<\/a><\/li>\n<li class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-91991\"><a href=\"https:\/\/port.lukasiewicz.gov.pl\/en\/silesian-university-of-technology\/activity\/\" class=\"elementor-item\" tabindex=\"-1\">Activity<\/a><\/li>\n<\/ul>\t\t\t<\/nav>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div class=\"elementor-element elementor-element-3747f22 e-flex e-con-boxed e-con e-parent\" data-id=\"3747f22\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t<div class=\"elementor-element elementor-element-34e35df e-con-full e-flex e-con e-child\" data-id=\"34e35df\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-f506dbe elementor-widget elementor-widget-heading\" data-id=\"f506dbe\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Researches<\/h2>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div class=\"elementor-element elementor-element-94c840a e-con-full e-flex e-con e-child\" data-id=\"94c840a\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-ce11d15 elementor-widget elementor-widget-text-editor\" data-id=\"ce11d15\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>Fabrication of planar photonic components using photolithography, etching, and nanoimprint. Precise photonic components can be fabricated using sequential photolithography and dry etching (RIE) of thin SiO\u2082\u2013TiO\u2082 layers. On the other hand, photolithography and\/or electron beam lithography are used to fabricate PDMS stamps for nanoimprint. Fabrication of photonic components using PDMS stamps can be a low-cost alternative to other methods of producing integrated photonic circuits.<br>  <\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1920708 elementor-widget elementor-widget-image\" data-id=\"1920708\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img alt=\"\" fetchpriority=\"high\" decoding=\"async\" width=\"700\" height=\"139\" src=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Wytwarzanie-planarnych-komponentow-fotonicznych-za-pomoca-fotolitografii-trawienia-i-nanoimprintu.webp\" class=\"attachment-full size-full wp-image-87526\" alt=\"\" srcset=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Wytwarzanie-planarnych-komponentow-fotonicznych-za-pomoca-fotolitografii-trawienia-i-nanoimprintu.webp 700w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Wytwarzanie-planarnych-komponentow-fotonicznych-za-pomoca-fotolitografii-trawienia-i-nanoimprintu-300x60.webp 300w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Wytwarzanie-planarnych-komponentow-fotonicznych-za-pomoca-fotolitografii-trawienia-i-nanoimprintu-24x5.webp 24w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Wytwarzanie-planarnych-komponentow-fotonicznych-za-pomoca-fotolitografii-trawienia-i-nanoimprintu-36x7.webp 36w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Wytwarzanie-planarnych-komponentow-fotonicznych-za-pomoca-fotolitografii-trawienia-i-nanoimprintu-48x10.webp 48w\" sizes=\"(max-width: 700px) 100vw, 700px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-5bf1e31 elementor-widget elementor-widget-text-editor\" data-id=\"5bf1e31\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>Photolithography enables the fabrication of microscale planar patterns in photoresist layers using photolithographic masks and UV light. Structures formed through photolithography are transferred to subsequent layers using wet or dry etching (Fig. 1) to produce planar photonic components such as waveguides, microring resonators, couplers, interferometers, etc.<br> <\/p><p>These components are fabricated in SiO\u2082\u2013TiO\u2082 layers previously prepared using the sol\u2013gel technique. Due to the need to obtain an appropriate refractive index contrast to achieve light guiding, SiO\u2082\u2013TiO\u2082 microstructures must be fabricated on glass substrates or Si\/SiO\u2082 substrates.<br> <\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-b0ac93e elementor-widget elementor-widget-image\" data-id=\"b0ac93e\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t<figure class=\"wp-caption\">\n\t\t\t\t\t\t\t\t\t\t<img alt=\"\" decoding=\"async\" width=\"700\" height=\"250\" src=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-1.-Schemat-wytwarzania-falowodow-SiO2-TiO2-za-pomoca-fotolitografii-i-trawienia.webp\" class=\"attachment-full size-full wp-image-87522\" alt=\"\" srcset=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-1.-Schemat-wytwarzania-falowodow-SiO2-TiO2-za-pomoca-fotolitografii-i-trawienia.webp 700w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-1.-Schemat-wytwarzania-falowodow-SiO2-TiO2-za-pomoca-fotolitografii-i-trawienia-300x107.webp 300w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-1.-Schemat-wytwarzania-falowodow-SiO2-TiO2-za-pomoca-fotolitografii-i-trawienia-24x9.webp 24w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-1.-Schemat-wytwarzania-falowodow-SiO2-TiO2-za-pomoca-fotolitografii-i-trawienia-36x13.webp 36w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-1.-Schemat-wytwarzania-falowodow-SiO2-TiO2-za-pomoca-fotolitografii-i-trawienia-48x17.webp 48w\" sizes=\"(max-width: 700px) 100vw, 700px\" \/>\t\t\t\t\t\t\t\t\t\t\t<figcaption class=\"widget-image-caption wp-caption-text\">Fig. 1. Schematic of SiO\u2082\u2013TiO\u2082 waveguide fabrication using photolithography and etching.<\/figcaption>\n\t\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bd6c40a elementor-widget elementor-widget-text-editor\" data-id=\"bd6c40a\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>Research on the fabrication of components based on SiO\u2082\u2013TiO\u2082 materials focuses on optimization of individual process steps to achieve high structuring resolution and low surface roughness of the etched waveguides.<\/p><p>The resolution of photolithography achieved so far makes it possible to obtain waveguides and ring resonators characterized by a spacing of approx. 1500 nm (Fig. 2a). On the other hand, the process of fabricating waveguides using RIE etching is being optimized with regard to reducing the sidewall roughness of the waveguides (Fig. 2b).  <\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-5a7fd8a elementor-widget elementor-widget-image\" data-id=\"5a7fd8a\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t<figure class=\"wp-caption\">\n\t\t\t\t\t\t\t\t\t\t<img alt=\"\" decoding=\"async\" width=\"700\" height=\"250\" src=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-2.-Fotolitografia-i-trawienie-RIE-po-lewej-zdjecie-z-mikroskopu-optycznego-ukazujace-odstep-1500-nm-miedzy-falowodem-a-mikro-rezonatorem-pierscieniowym-po-prawej-obraz-SEM-widok.webp\" class=\"attachment-full size-full wp-image-87524\" alt=\"\" srcset=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-2.-Fotolitografia-i-trawienie-RIE-po-lewej-zdjecie-z-mikroskopu-optycznego-ukazujace-odstep-1500-nm-miedzy-falowodem-a-mikro-rezonatorem-pierscieniowym-po-prawej-obraz-SEM-widok.webp 700w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-2.-Fotolitografia-i-trawienie-RIE-po-lewej-zdjecie-z-mikroskopu-optycznego-ukazujace-odstep-1500-nm-miedzy-falowodem-a-mikro-rezonatorem-pierscieniowym-po-prawej-obraz-SEM-widok-300x107.webp 300w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-2.-Fotolitografia-i-trawienie-RIE-po-lewej-zdjecie-z-mikroskopu-optycznego-ukazujace-odstep-1500-nm-miedzy-falowodem-a-mikro-rezonatorem-pierscieniowym-po-prawej-obraz-SEM-widok-24x9.webp 24w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-2.-Fotolitografia-i-trawienie-RIE-po-lewej-zdjecie-z-mikroskopu-optycznego-ukazujace-odstep-1500-nm-miedzy-falowodem-a-mikro-rezonatorem-pierscieniowym-po-prawej-obraz-SEM-widok-36x13.webp 36w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-2.-Fotolitografia-i-trawienie-RIE-po-lewej-zdjecie-z-mikroskopu-optycznego-ukazujace-odstep-1500-nm-miedzy-falowodem-a-mikro-rezonatorem-pierscieniowym-po-prawej-obraz-SEM-widok-48x17.webp 48w\" sizes=\"(max-width: 700px) 100vw, 700px\" \/>\t\t\t\t\t\t\t\t\t\t\t<figcaption class=\"widget-image-caption wp-caption-text\">Fig. 2. Photolithography and RIE etching: (left) optical microscope image showing the gap (1500 nm) between the waveguide and the microring resonator, (right) SEM image (52\u00b0 tilted view) of the waveguide.<br><\/figcaption>\n\t\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-50b97f6 elementor-widget elementor-widget-text-editor\" data-id=\"50b97f6\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>Nanoimprint is the subject of research due to the low cost of fabricating planar photonic components using this technique. This method allows multiple (depending on the degree of process optimization) replications of a pattern from the same previously structured substrate. Waveguides, microring resonators, and other components are first fabricated using photolithography and then replicated in PDMS, from which the resulting molds can serve as stamps for the nanoimprint method in sol\u2013gel materials based on silicon and titanium oxides.  <\/p><p>Similarly, more precise and smaller patterns, such as diffraction gratings, are fabricated using electron beam lithography and subsequently replicated in PDMS for the nanoimprint technique. Within the project, the nanoimprint method is being optimized with regard to: appropriate replication depth in sol\u2013gel layers, reduction of layer cracking caused by high-temperature annealing, achieving high resolution, uniformity, and reproducibility of photonic component shapes (Fig. 3).<br> <\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-a0e5795 elementor-widget elementor-widget-image\" data-id=\"a0e5795\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t<figure class=\"wp-caption\">\n\t\t\t\t\t\t\t\t\t\t<img alt=\"\" loading=\"lazy\" decoding=\"async\" width=\"700\" height=\"250\" src=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-3.-Zdjecie-z-mikroskopu-optycznego.webp\" class=\"attachment-full size-full wp-image-87581\" alt=\"\" srcset=\"https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-3.-Zdjecie-z-mikroskopu-optycznego.webp 700w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-3.-Zdjecie-z-mikroskopu-optycznego-300x107.webp 300w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-3.-Zdjecie-z-mikroskopu-optycznego-24x9.webp 24w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-3.-Zdjecie-z-mikroskopu-optycznego-36x13.webp 36w, https:\/\/port.lukasiewicz.gov.pl\/wp-content\/uploads\/sites\/35\/2025\/09\/Rys.-3.-Zdjecie-z-mikroskopu-optycznego-48x17.webp 48w\" sizes=\"(max-width: 700px) 100vw, 700px\" \/>\t\t\t\t\t\t\t\t\t\t\t<figcaption class=\"widget-image-caption wp-caption-text\">Fig. 3. Optical microscope image showing SiO\u2082\u2013TiO\u2082-based photonic components fabricated using the nanoimprint technique: (left) waveguides of various widths, (right) waveguide and microring resonator.<\/figcaption>\n\t\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"<p>Silesian University of Technology Researches Fabrication of planar photonic components using photolithography, etching, and nanoimprint. Precise photonic components can be fabricated using sequential photolithography and dry etching (RIE) of thin SiO\u2082\u2013TiO\u2082 layers. On the other hand, photolithography and\/or electron beam lithography are used to fabricate PDMS stamps for nanoimprint. Fabrication of photonic components using PDMS [&hellip;]<\/p>\n","protected":false},"author":291,"featured_media":0,"parent":91982,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_acf_changed":false,"_seopress_robots_primary_cat":"","_seopress_titles_title":"","_seopress_titles_desc":"","_seopress_robots_index":"","inline_featured_image":false,"footnotes":""},"class_list":["post-91986","page","type-page","status-publish","hentry"],"acf":{"page_icon":null},"publishpress_future_action":{"enabled":false,"date":"2026-04-30 15:37:35","action":"change-status","newStatus":"draft","terms":[],"taxonomy":"translation_priority","extraData":[]},"publishpress_future_workflow_manual_trigger":{"enabledWorkflows":[]},"_links":{"self":[{"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/pages\/91986","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/users\/291"}],"replies":[{"embeddable":true,"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/comments?post=91986"}],"version-history":[{"count":2,"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/pages\/91986\/revisions"}],"predecessor-version":[{"id":91996,"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/pages\/91986\/revisions\/91996"}],"up":[{"embeddable":true,"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/pages\/91982"}],"wp:attachment":[{"href":"https:\/\/port.lukasiewicz.gov.pl\/en\/wp-json\/wp\/v2\/media?parent=91986"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}