Optical lithography

• SÜSS MicroTec Mask Aligner MA8/BA8
  

• Heidelberg Instruments µMLA Tabletop Maskless Aligner
  

• Spincoatery (SÜSS RCD8, Laurell WS-650)

Vacuum deposition/sputtering

• Moorfield MiniLab 060 (magnetron sputtering)
  

• Moorfield MiniLab 080 (electron-beam evaporation)
  

Plasma-enhanced chemical vapor deposition (PECVD)

Sentech SI 500 208 (materiały: SiO2, Si3N4)

Atomic layer deposition (ALD)

Beneq TFS 200 (materials: Al₂O₃, ZnO)

Plasma etching and cleaning

• Sentech SI 500206 (ICP-RIE, gases: Ar, O₂, SF₆, CF₄, CHF₃, C₄F₈)
  

• Sentech SI 500207 (ICP-RIE, gases: Ar, O₂, SF₆, CF₄, SiCl₄, BCl₃, Cl₂)
  

• TePla GIGAbatch 310M (plasma cleaning, gases: O₂, CF₄)
  

• Diener Zepto (plasma cleaning, gases: O₂, Ar)
  
  
  

Annealing

• RTP AS-One 150 (rapid thermal processing)
  

• Laboratory dryers: Binder FD53, Binder FD56
  

• Hot plates (SÜSS HP8, EMS 1200-1HT)
  

Printing of conductive tracks

XTPL Delta Printing System

Measurements

• Inspection microscopes: Leica DM 4000, Leica DM 8000, Keyence VHX-7000
  

• Bruker DektaXT (stylus profilometer)
  

• Bruker ContourGT (optical profilometer)
  

• Sentech SE850 DUV (spectroscopic ellipsometer)