Offer
Clean Room Laboratory
Photolithography
Fabrication of patterns in photoresist using a mask and a UV mercury lamp with a resolution of approx. 1 µm
SÜSS MicroTec Mask Aligner MA8/BA8
Maskless optical lithography
Fabrication of patterns in photoresist using maskless UV lithography (LED/DMD or laser) with a resolution of approx. 1 µm
Heidelberg Instruments µMLA Tabletop Maskless Aligner
Precision printing of metallic traces
Fabrication of microscale conductive silver traces
Fabrication of microscale conductive silver traces
Thin-film deposition using magnetron sputtering
Deposition of thin layers of materials such as metals (Cu, Ti, Ni, Au, etc.) and oxides (e.g., SiO₂)
Moorfield MiniLab 080
Atomic layer deposition (ALD)
Atomic layer deposition of Al₂O₃, ZnO
Beneq TFS 200-312
Plasma-enhanced chemical vapor deposition (PECVD)
Deposition of thin SiO₂, Si₃N₄ layers
Sentech SI 500 208
Plasma etching
Precision ICP-RIE etching using gases: Ar, O₂, SF₆, CF₄, CHF₃, C₄F₈, SiCl₄, BCl₃, Cl₂. Two separate reactors for etching: Si, SiO₂, SiO₂–TiO₂
b) III–V semiconductors (GaN, AlGaN)
Sentech SI 500 206, Sentech SI 500 207
Plasma cleaning
Microwave plasma O₂, CF₄, Ar
TePla GIGAbatch 310M, Diener Zepto
Contact profilometry
Height and surface roughness measurements
Bruker DektaXT
Optical profilometry
Height and surface roughness measurements
Bruker ContourGT
Spectroscopic ellipsometry
Measurement across the wide UV-VIS-NIR spectral range (190 nm to 3.5 µm). Determination of refractive index and thin-film thickness.
Sentech SE850 DUV
Rapid thermal processing (RTP)
Substrate annealing using the RTP method at temperatures up to 1200°C
Annealsys AS-One 150
Drying (laboratory dryer)
Annealing across a wide temperature range (up to 300°C)
Binder FD53, Binder FD56
Heating (hot plate)
Substrate annealing with high uniformity (±0.5°C below 120°C, ±1% above 120°C) and precision within the range up to 250°C
SÜSS HP8 Hot plates
Spin coating
Fabrication of thin material layers by spin coating (e.g., photoresist), with thickness dependent on spin speed.
SÜSS RCD8, Laurell WS-650, POLOS SPIN 150i
Optical microscopy
High-precision, high-resolution microscopic observation and sample measurements
Leica DM 4000, DM 8000, Keyence VHX-7000
Do you have a question?
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- laboratoria@port.lukasiewicz.gov.pl
- +48 510 131 925
- 147 Stabłowicka Street, 54-066 Wrocław
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