Equipments

Materials and Technological Research Laboratory

Equipments

The Materials and Technological Research Laboratory is equipped with advanced and diverse research infrastructure, enabling comprehensive materials analysis.

We provide state-of-the-art electron microscopes (SEM, TEM) equipped with additional detectors (EDS, EBSD, EELS, CL, RS), which significantly expand analytical and imaging capabilities. Exceptional functionality is ensured by specialized QEMSCAN® software, enabling detailed mineralogical analysis of materials.

Our infrastructure also includes advanced instrumentation such as mass spectrometers, liquid chromatographs, NMR spectrometers, confocal microscopes, an electron microscope, spectrophotometers, and automated pipetting stations.

In addition, the laboratory is equipped with high-class diffractometers, spectrometers, thermal analysis systems, precision laser micromachining systems, aging and corrosion test chambers, as well as additional instruments for measuring physicochemical properties.

The use of diverse research techniques allows us to perform a broad range of analyses tailored to the individual needs of clients from various industries.

Optical lithography

  • SÜSS MicroTec Mask Aligner MA8/BA8
  • Heidelberg Instruments µMLA Tabletop Maskless Aligner
  • Spincoatery (SÜSS RCD8, Laurell WS-650)

Vacuum deposition/sputtering

  • Moorfield MiniLab 060 (magnetron sputtering)
  • Moorfield MiniLab 080 (electron-beam evaporation)

Plasma-enhanced chemical vapor deposition (PECVD)

  • Sentech SI 500208 (materiały: SiO2, Si3N4)

Atomic layer deposition (ALD)

  • Beneq TFS 200 (materials: Al₂O₃, ZnO)

Plasma etching and cleaning

  • Sentech SI 500 206 (ICP-RIE, gazy: Ar, O2, SF6, CF4, CHF3, C4F8)
  • Sentech SI 500 207 (ICP-RIE, gazy: Ar, O2, SF6, CF4, SiCl4, BCl3, Cl2)
  • TePla GIGAbatch 310M (plasma cleaning, gases: O₂, CF₄)
  • Diener Zepto (plasma cleaning, gases: O₂, Ar)

Annealing

  • RTP AS-One 150 (rapid thermal processing)
  • Laboratory dryers: Binder FD53, Binder FD56
  • Hot plates (SÜSS HP8, EMS 1200-1HT)

Printing of conductive tracks

  • Fabrication of microscale conductive silver traces

Measurements

  • Inspection microscopes: Leica DM 4000, Leica DM 8000, Keyence VHX-7000
  • Bruker DektaXT (stylus profilometer)
  • Bruker ContourGT (optical profilometer)
  • Sentech SE850 DUV (spectroscopic ellipsometer)

Scanning electron microscopes, SEM

  • FEI HELIOS NANOLAB 660 (Thermo Fisher Scientific, formerly FEI)
  • FEI HELIOS NANOLAB 450HP (Thermo Fisher Scientific, formerly FEI)
  • FEI QUANTA 650F (QEMSCAN®) (Thermo Fisher Scientific, formerly FEI)

Transmission electron microscopes (TEM)

  • FEI TECNAI G2 X-TWIN (Thermo Fisher Scientific, formerly FEI)
  • FEI TITAN3 G2 60-300 (Thermo Fisher Scientific, formerly FEI)

Spectroscopic analysis instruments

  • FTIR spectrometer Nicolet 6700 (Thermo Scientific)
  • FTIR microscope Nicolet iN10 MX (Thermo Scientific)
  • Raman confocal microscope WITec alpha300 R (WITec)

X-ray analysis instruments

  • X-ray diffractometer Empyrean (PANalytical)
  • XRF spectrometer S2 Puma (Bruker)

Elemental analysis instruments

  • iCAP 7400 spectrometer (Thermo Scientific)
  • Analyzers for determining carbon and sulfur content: CS-r (ELTRA), CS744 (LECO)
  • XRF spectrometer S2 Puma (Bruker)

Thermal analysis instruments

  • Thermogravimetric analyzer TGA 2 (Mettler Toledo)
  • Modulated differential scanning calorimeter MT-DSC DSC1 (Mettler Toledo)
  • Thermomechanical analysis systems TMA/SDTA LN 600 and LF 1100 (Mettler Toledo)
  • Dynamic mechanical analysis system DMA/SDTA 861 (Mettler Toledo)
  • Thermal analyzer (TG-DSC) STA 449 F1 Jupiter (Netzsch)
  • Thermal analyzer coupled with QMS and IR with ATR (Netzsch STA 449 F1 Jupiter; Bruker FTIR Tensor 27; QMS Aeolos)
  • Laser flash system for thermal diffusivity measurements LFA 457 MicroFlash (Netzsch)
  • Thermal conductivity measurement system HFM 436 Lambda (Netzsch)

Laser micromachining instruments

  • Picosecond laser micromachining systems Optec SP450T, CO₂ and fiber laser processing system FL400 OPTEC, excimer laser micromachining system PROMASTER ATL/OPTEC, integrated laser system NT 342A-10 (EKSPLA)
  • Picosecond laser micromachining system Optec SP450T with DLIP module

Aging test equipment

  • Accelerated aging chamber with UV QUV Spray lamps (Q-Lab)
  • Thermal shock chamber TS60 (Weiss)
  • Salt fog chamber WSC KWT450/SO2 (Weiss)
  • Climatic chamber WK3-340 (Weiss)

Equipment for additional services

  • Physical sorption analyzer 3Flex (Micromeritics)
  • Mercury porosimeter AutoPore IV 9510 (Micromeritics)
  • Helium pycnometer AccuPyc 1340 (Micromeritics)
  • Optical goniometer OCA35 (DataPhysics Instrument)
  • Tensiometer DCAT11 (DataPhysics Instrument)
  • ZetaSizer Nano ZS (Malvern)
  • Aparat HMS 8407 (LakeShore Cryotronics)

High-resolution mass spectrometer Orbitrap Exploris 480 (Thermo Scientific)

  • Ion sources: HESI, nanoESI
  • FAIMS ion mobility module
  • Coupled with Vanquish Neo liquid chromatograph (Thermo Scientific)

Low-resolution mass spectrometer LCMS-8045 (Shimadzu), QqQ type

  • Mass analyzer: triple quadrupole
  • Ion source: ESI
  • Fragmentation: CID
  • Coupled with ultra-high-performance liquid chromatograph Nexera X2 (Shimadzu)

Ultra-high-performance liquid chromatograph Ultimate 3000 (Thermo Scientific)

  • Diode array detector (DAD)
  • Fluorescence detector (FLD)

Mass spectrometer LTQ Orbitrap Elite (Thermo Scientific)

  • Ion sources: HESI, nanoESI, APCI
  • FAIMS ion mobility module
  • Coupled with Easy nanoLC 1000 / Ultimate 3000 liquid chromatograph (Thermo Scientific)

NMR spectrometer: Avance III HD 500 MHz (Bruker)

  • Autosampler: 60-position changer
  • Broadband probes for solution measurements: BBI and BBO
  • Variable temperature unit: –150 to 150 °C (BCUII with N₂ dewar)

NMR spectrometer: Avance III HD 600 MHz (Bruker)

  • Ion sources: HESI, nanoESI, APCI
  • FAIMS ion mobility module
  • Coupled with Easy nanoLC 1000 / Ultimate 3000 liquid chromatograph (Thermo Scientific)

NMR spectrometer: Avance III HD 700 MHz (Bruker)

  • Autosampler: 24-position changer
  • Broadband probe for solution measurements: BBO
  • Three-channel probes for solution measurements: TXI (P and N)
  • 4-channel cryoprobe for solution measurements: QCI
  • Variable temperature unit: –150 to 150 °C (BCUII with N₂ dewar); for the QCI probe: –40 to 80 °C

Dual-beam scanning electron microscope SEM/FIB Zeiss Auriga 60

  • CrossBeam system with Cobra ion column
  • Field emission gun (FEG): operating voltage 0.1–30 kV
  • Detectors: SE2, InLens, BSD, ESB, STEM, EDS (X-Max, Oxford Instruments)
  • Gas injection system (GIS): Pt, W, H₂O, insulator
  • Cryo SEM/FIB module: Quorum Technologies

Electron microscopy sample preparation

  • Ultramicrotome: Leica EM UC7 with Leica FC7 cryo chamber
  • High-vacuum coater: Leica EM ACE 600
  • Critical point dryer: Leica EM CPD 300

Confocal microscope: Leica SP8 MP

  • Stand: upright
  • Scanner: conventional and resonant (8 kHz)
  • VIS lasers: 405, 488, 552, 638 nm
  • IR laser: ChameleonVision II, femtosecond pulses, tunable wavelength range 680–1080 nm
  • Detectors: 4 internal PMTs, 1 HyD detector, 4 external NDD-PMTs
  • Objectives: 10× (NA 0.40), 20× (NA 0.75), 25× (NA 0.95 W), 40× (NA 1.10 W; NA 1.3 Oil), 63× (NA 1.4 Oil)
  • Motorized scanning stage
  • Temperature controller and heating insert for Petri dishes
  • System for intravital imaging of laboratory mice

Zeiss Cell Observer SD confocal microscope

  • Inverted stand
  • Spinning disk module Yokogawa CSU-X1 A 5000
  • Lasers: 405, 488, 561, 639 nm
  • 2 EMCCD cameras QImaging Rolera EM-C2 (dual camera)
  • Objectives: 10× (NA 0.30), 20× (NA 0.4 LD), 25× (NA 0.80 W), 40× (NA 0.6 LD; NA 1.20 W; NA 1.4 Oil), 63× (NA 1.20 W; NA 1.4 Oil), 100× (NA 1.46 Oil)
  • Motorized scanning stage with Definite Focus module
  • Incubator XLmulti S1, heating insert for 96-well plates
  • Temperature and O₂/CO₂ concentration controller
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