Clean Room laboratory

Clean Room Laboratory is located in an ISO 5 and ISO 6 class room.

The main methods developed and deployed at the laboratory are optical and electron lithography, production of metallic and dielectric layers, and wet and plasma etching. Our ambition is also to develop technology in manufacturing thin films using atomic layer deposition. Moreover, the laboratory has full capacity to analyze and validate structures and microcomponents.

  • Production of thin layers:
    • Production of dielectric and conductive layers (evaporation, magnetron sputtering, PECVD)
    • Production of polymer layers (spin coating, dip coating)
    • Atomic Layer Deposition
  • Methods of production patterns:
    • Optical lithography with nanoimprint
    • Electron lithography
  • Etching:
    • Wet etching of semiconductors, oxides, nitrides
    • Reactive plasma etching of silicon-based materials and complex semiconductors (ICP/RIE)
    • Wet and plasma cleaning
  • Back-end processes:
    • Thermal treatment (heating in an appropriate atmosphere), Rapid Thermal Processing (RTP)
  • Characteristics of structures:
    • Stylus profilometry
    • Optical profilometry
    • Optical and electron microscopy (SEM)
    • Preparation of micro cross-sections with focused ion beam (FIB)
    • Elipsometry
  • Lithography:
    • SÜSS MicroTec Mask Aligner MA8/BA8 with the nanoimprint system
    • Heidelberg Instruments mMLA – laser lithography
    • Spin coater (SÜSS MicroTec, Laurell)
    • Heating ovens Binder FD 53
    • Heating ovens Binder FD 56
  • Plasma etching:
    • SentechPlasma ICP/RIE SI 500
  • Evaporation/sputtering:
    • Moorfield MiniLab 060
    • Moorfield MiniLab 080
    • Prevac
  • Chemical Vapor Deposition:
    • Sentech PECVD SI 500 D
  • Annealing:
    • Rapid Thermal Processor AS-One 150
  • Characterization and analysis:
    • Electron microscope FEI Helios NanoLab 660 with FIB
    • Ellipsometer Sentech SE850 DUV
    • Brucker stylus profilometer
    • Brucker optical profilometer
    • Inspection microscopes: Leica DM 4000, DM 8000, Keyence VHX-7000
  • Clean Room facility ISO 5, ISO 6