The Clean Room Laboratory is located in rooms with ISO 5 and ISO 6 cleanliness classes according to ISO 14644 standard. We have clean rooms with a total area of > 600 m2. In this type of laboratory, we have constant monitoring of parameters such as temperature and humidity. Periodic cleanliness measurements confirm the cleanliness class. The amount of dust or other micro-particles is kept constantly low. Additionally, the rooms designed for lithography are equipped with special lighting systems that minimize the amount of light that could interfere with the photolithography process.

The main techniques developed and implemented in the laboratory are optical and laser lithography, manufacturing of metallic and dielectric layers, as well as wet and plasma etching. Our ambition is also to develop competence in the production of thin layers by the atomic layer deposition method and the integration of semiconductor materials. The laboratory has full capability for the analysis and validation of structures of microcomponents produced, both through precise microscopy and two profilometers – contact and optical.

The laboratory also includes a department dealing with changes in material properties. There are several types of lasers (including an ultra-precise picosecond laser) that can be used for cutting, engraving, structuring, removing thin layers, and finally – changing the properties of materials on any type of material, traditionally for materials engineering. In addition to lasers, a printer using the deposition of a selected type of ink on the surface is used to create micro-patterns. Thanks to the presence of a glovebox, it is also possible to carry out processes such as heating, spin coating, and spraying of thin layers in an inert atmosphere – nitrogen. Recently, in the CR-Lab, it is also possible to conduct research on, among others, the mobility of carriers in semiconductors using an ultra-precise Hall effect measurement device.

Contact: zapytania@port.lukasiewicz.gov.pl